Wednesday, February 27, 2008

New Technical T&M Web Seminar: C-V Measurements and Materials Research


LIVE WEB SEMINAR

FREE TECHNICAL ONLINE SEMINAR

Semiconductor
Capacitance-Voltage (C-V)
Testing Fundamentals


Seminar Content

This seminar is designed to introduce the topic of C-V measurements as they relate to semiconductor device and materials characterization. C-V testing is commonly used to determine semiconductor parameters such as doping profiles, density of interface states, threshold voltages, oxide charge, and carrier lifetime.

After attending this seminar, you will understand:

  • What is C-V testing?
  • What types of devices can C-V testing be used to characterize?
  • Who can use C-V?
  • C-V measurement challenges

About the Presenter:
Lee Stauffer is Senior Staff Technologist for Keithley Instruments' Semiconductor Measurements Group, based in Cleveland, Ohio. Prior to joining Keithley, his career included designing satellite communication systems, as well as equipment and product engineering in semiconductor fabs.


This seminar is recommended for engineers new to semiconductor materials and device testing, process and device engineers who would like to refresh their knowledge of this testing methodology, and characterization lab managers.

This informative 45-minute seminar is followed by an interactive Q&A (during live broadcast only) where you can ask the presenter for additional insight on this important topic.

When is it?

Europe: Thursday, March 6, 2008
15:00 Central European Time
(UTC/GMT: 14:00)
 

How Do I Register?

Register today to reserve your place!
There is NO CHARGE for you to participate in this important industry event.

The seminar will be broadcasted over the internet and requires your registration prior to the event.

To register for this webcast seminar click here.



Please forward this invitation to any colleagues
who might be interested in this free seminar!


Thank you for your time! We look forward to your attendance!

Your Keithley Instruments' Team





Monday, February 25, 2008

ECS - 213th Meeting - Registration Open

CS - 213th Meeting - Registration Open

REGISTRATION IS NOW OPEN!
213th ECS Meeting
May 18-22, 2008
Phoenix, AZ

For more information and to register, please visit our website: http://www.electrochem.org/.

Please note these important deadlines for the Phoenix Meeting:

1. Meeting and Short Course Registrations are due to ECS Headquarters no later than April 18, 2008 to qualify for the advance registration discount.

Register for the meeting using our online system that processes your Visa, MasterCard, or American Express credit card payment in real time:
https://community.electrochem.org/eweb/DynamicPage.aspx?webcode=CSCEventsSearch&Site=ecs

If you prefer, send or fax a hard copy of your meeting registration forms with payment to The Electrochemical Society, 65 South Main St., Pennington, NJ 08534, USA, Phone: 1.609.737.1902, Fax: 1.609.737.2743, E-mail: ecs@electrochem.org, no later than April 18, 2008. You can download the meeting registration brochure at:
http://www.electrochem.org/meetings/biannual/213/phoenix_reg_bro.pdf

Please Note: All technical registrations include a copy of the meeting abstracts on CD-ROM only. Attendees who wish to have paper copies of abstracts should download them in advance of the meeting from the ECS website:
http://ecsmeet5.peerx-press.org/jsp/mas/reportSymposiumList.jsp

2. Hotel reservations are due no later than April 18, 2008!

Located in the center of downtown – steps from the Phoenix Convention Center, Symphony Hall, and Herberger Theater – the Hyatt Regency Phoenix Hotel places you near spectacular sports, arts, culture, and attractions. 

A block of rooms have been reserved for May 5-27, 2008.  The special room rate will be available until April 18th or until the group block is sold-out, whichever comes first.
Special Room Rates:

 $165 per night, per room for single/double occupancy
 $215 per night, per room for triple occupancy
 $240 per night, per room for quadruple occupancy

Please follow the link to make a hotel room reservation online: http://phoenix.hyatt.com/groupbooking/phxrptels2008

See you at the Hyatt Regency Phoenix in May!

www.electrochem.org

Batteries, Fuel Cells, and Energy Conversion • Biomedical Applications and Organic Electrochemistry • Corrosion, Passivation, and Anodic Films • Dielectric and Semiconductor Materials, Devices, and Processing • Electrochemical/Chemical Deposition and Etching • Electrochemical Synthesis and Engineering • Fullerenes, Nanotubes, and Carbon Nanostructures • Nanotechnology, Nanomaterials, and Nanoscience • Physical and Analytical Electrochemistry • Sensors and Displays: Principles, Materials, and Processing

Tuesday, February 19, 2008

Design News: Volume 8, Issue 7

Freescale Technical Update


© Freescale Semiconductor, Inc. 2004 - 2008. All Rights Reserved

 

Monday, February 11, 2008

International Conference on IC Design & Technology - Minatec Grenoble, France; June 2nd – June 4th , 2008


 
Call for Papers
 

Paper Deadline: February 29th, 2008
International Conference on IC Design & Technology
Minatec Grenoble, France;
June 2nd – June 4 th, 2008


As IC design & process technology continue to advance for increased performance, lower power, and accelerated time-to-market, the engineering activities, traditionally separated along the boundary of design and process technology, will have difficulties in meeting the shrinking window of product optimization tasks. The International Conference on IC Design & Technology provides a forum for engineers, researchers, scientists, professors and students to cross this boundary through interactions of design and process technology on product development & manufacturing. The unique workshop style of the conference provides an opportunity to technologists and product designers to e xchange breakthrough ideas and collaborate effectively. T wo days of technical presentations and workshops will be preceded by a one-day tutorial program of value to both the expert and the beginner.

The venue of 2008 ICICDT will be Minatec® – Maison des Micro et Nano Technologies at Grenoble, France: www.icicdt.org

Papers are solicited on:
•  Design approaches including system, circuit and EDA to manage power, leakage, process variation, signal integrity, reliability, yield, and manufacturability.
  Advanced VLSI design, including processors, ASICs, memories, analog and mixed-signal circuits.
•  System-on-Chip (SoC), System-in-Package (SiP), and IP reuse for fast design closure.
  Advanced materials, advanced metallization, and 3D interconnection as both, novel interconnect scheme for future MPUs and approach for realization of SoCs.
•  Process and circuit technology for advanced memories: MRAM, FeRAM, PRAM, Nanocrystal Memory, Flash, etc with emphasis on reliability.
•  Advanced transistor structures for bulk, multiple Gate, FDSOI, PDSOI, SSOI, SiGe, etc technologies
  RFCMOS characterization, model, simulation for multiple gate technologies
•  New gate materials for adjusting Vt, enhanced mobility & scalability, low leakage, and low power.
  SER, thermal, leakage, PID, reliability, yield, etc effects on advanced transistor structures and circuits.
•  Simulation & modeling on advanced process, device & circuit.
•  Nanotechnology materials, devices and circuits.
•  Emerging IC technologies and circuits crossover such as organic IC's, integrated sensors and integrated actuators.


Prospective authors are invited to submit a camera-ready paper of maximum four pages in length, including figures and references. The authors should obtain paper submission guidelines from http://www.ICICDT.org. Accepted/Invited papers will be printed in the proceedings of the conference (also available on CD-ROM). Paper submission deadline is February 29, 2008.



Conference Format

ICICDT features a popular and unique format structured to maximize face-to-face interaction. An abbreviated synopsis of each paper is presented in a plenary session, following which a workshop-style forum allows for deeper give-and-take communication on an individual basis. Many participants in previous years have commented that this interaction is very rewarding.

Contact Information

For further general information or assistance in selecting a subject area, please contact:

  Organizing Committee:

- General chair

Tanay Karnik

tanay.karnik@intel.com

- Conference chair

Amara Amara

amara.amara@isep.fr

- Executive committee chair

Thuy Dao

thuy.dao@freescale.com

- Local arrangement chair

Marc Belleville

marc.belleville@cea.fr

- Publication chair

Thomas Ea

thomas.ea@isep.fr

- Publicity chair

Ingo Aller

aller@de.ibm.com

- Tutorial chair

Ali Keshavarzi

ali.keshavarzi@intel.com

- Treasurer

Christine Nora

c.nora@ieee.org

- Secretary

Jean-Luc Leray

jean-luc.leray@cea.fr

  Technical Sub-Committee Chairs:

Advanced Memory Devices

 

- Susumu Shuto

susumu.shuto@toshiba.co.jp


- Jan Ackaert

jan_ackaert@amis.com




CAD

 

- Ruchir Puri

ruchir@us.ibm.com




DFM/DFT/DFR/DFY

 

- Keith Bowman

keith.a.bowman@intel.com


- Jason Stinson

jason.stinson@intel.com




Low Power

 

- Toshinari Takayanagi

ttoshi@pasemi.com


- Geoffrey Yeap

gyeap@qualcomm.com




SoC/MPSoC/SIP, IC & Platform Design and Process

 

- Aurangzeb Khan
- Dac Pham

akkhan@cadence.com
dac.pham@freescale.com




SER

 

- Giorgio Cellere

giorgio.cellere@ieee.org




System Level Technology Assessment

 

- Phillip Christie

phillip.christie@nxp.com


Emerging Technology

 

- Simon Deleonibus

simon.deleonibus@cea.fr




RF & Analog, Mixed signal

 

- Didier Belot

didier.belot@st.com




NBTI & High K Gate Reliability

 

- Koji Eriguchi

eriguchi@kuaero.kyoto-u.ac.jp




Advanced Materials

 

- Chadwin Young

Chadwin.young@sematech.org




Adv. Transistor Structure, Architecture & Process

 

- Dong-Won Kim
- Arnaud Pouydebasque 

timo.kim@samsung.com
arnaud.pouydebasque@nxpcrolles.st.com

 

 

 


 
 

Thursday, February 7, 2008

SIES 2008 Call for Papers: **Final Deadline Extension for Long Papers: Feb. 18**

Dear All,

Due to numerous late requests, the SIES'2008 long papers deadline has been
postponed to Feb. 18.

-------------------------------------------------------------------------
| CALL FOR PAPERS |
|-----------------------------------------------------------------------|
| SIES'2008 |
| IEEE Third Symposium on Industrial Embedded Systems |
| June 11- 13, 2008 |
| Montpellier - La Grande Motte, FRANCE |
|-----------------------------------------------------------------------|
Conference web site:

http://www.lirmm.fr/SIES2008/

-----------------------------------------------------------------------

Sponsored by:
IEEE Industrial Electronics Society
LIRMM CNRS/University of Montpellier II


AIM
------------------------------------------------------------------------
The aim of the symposium is to bring together researchers and practitioners
from industry and academia and provide them with a platform to report on
recent developments, deployments, technology trends and research results, as
well as initiatives related to embedded systems and their applications in a
variety of industrial environments.
------------------------------------------------------------------------

BACKGROUND
------------------------------------------------------------------------
Application domains have had a considerable impact on the evolution of
embedded systems, in terms of required methodologies and supporting tools
and resulting technologies. SoCs and SoPC are slowly making inroads into the
area of industrial automation to implement complex field-area intelligent
devices which integrate the intelligent sensor/actuator functionality by
providing on-chip signal conversion, data processing, and communication
functions. There is a growing tendency to network field-area intelligent
devices around industrial type of communication networks. Similar trends
appear in the automotive electronic systems where the Electronic Control
Units, typically implemented as heterogeneous system-on-chip, are networked
by means of one safety-critical communication protocol. The design of this
kind of networked embedded systems (this includes also hard real-time
industrial control systems) is a challenge in itself due to the distributed
nature of processing elements, sharing common communication medium, and
safety-critical requirements, to mention some.
------------------------------------------------------------------------


TOPICS OF INTEREST
------------------------------------------------------------------------
Topics within the scope of the symposium will include, but are not limited
to:
-Embedded Systems
-System-on-Chip and Network-on-Chip Design & Testing
-Networked Embedded Systems
-Embedded Applications
-Multi-Processors Systems-on-Chips
-Sensors networks and ubiquitous computing
-Application of Reconfigurable and Adaptive Systems
-Automotive / Avionics systems
-Fault-tolerant embedded systems and applications
------------------------------------------------------------------------

SOLICITED PAPERS :
------------------------------------------------------------------------
- Long Papers - limited to 8 double column pages.
- Industry Practice (IP)– limited to 8 double column pages.
- Work-in-Progress (WIP)– limited to 4 double column pages.

Manuscripts must be submitted electronically in PDF format, according to the
instructions contained in the Symposium web site.
------------------------------------------------------------------------

AUTHOR'S SCHEDULE (Deadlines):
------------------------------------------------------------------------
Deadline for submission of proposals for long papers: Feb 18, 2008 **FINAL
DEADLINE EXTENSION**
Notification of acceptance for long papers: Apr 1,2008
Final manuscripts for long papers submission: Apr 22,2008

Deadline for WIP and IP papers: Mar 28, 2008
**EXTENDED DEADLINE**
Notification of acceptance of WIP and IP papers: Apr 25, 2008
Final manuscripts of WIP & IP papers submission: May 2, 2008
------------------------------------------------------------------------

SPECIAL SESSION ORGANIZATION :
------------------------------------------------------------------------
To enhance the technical program and focus on specific topics and areas, the
SIES'2008 Symposium will include special sessions, in addition to regular
ones. Special sessions can cover subjects or cross-subjects belonging to the
topics of interest, or novel topics related with the ones identified within
the topics of interest. Special sessions can also have the drive from
specific R&D projects or clusters of projects, namely EU-sponsored R&D
projects.
------------------------------------------------------------------------

SIES'2008 COMMITTEES
------------------------------------------------------------------------
General Co-Chairs:
Luis Gomes, Univ. Nova Lisboa, PT
Gilles Sassatelli, LIRMM, CNRS/Univ. Montpellier 2, FR

Program Co-Chairs:
Leandro Indrusiak, Tech. Univ. Darmstadt, DE
Nicolas Navet, LORIA, FR

Work in Progress Co-Chairs:
Luis Almeida, Univ. Aveir, PT
Josep M. Guerrero, UPC, ES

Industry Liaison Committee:
Joao Miguel Fernandes (chair) Univ. Minho PT
Andrea Andenna, ABB Corporate Research, SE
Armando Walter Colombo, Schneider Electric, DE
Jean-Pierre Schoellkopf, STM Grenoble, FR
Jean-Michel Daga, ATMEL Rousset, FR
Vladimir Oplustil, UNIS, CZ


Finance Chair:
Pascal Benoit, LIRMM, FR

International Advisory Committee:
Richard Zurawski, ISA Group, USA (chair)
Bogdan Wilamowski Auburn University USA
Carlos Couto, University of Minho, PT
Charles Andre, I3S/UNSA , FR
Francoise Simonot-Lion, LORIA, FR
Giuseppe Buja, University of Padova, IT
Grant Martin, Tensilica, USA
J. David Irwin, Auburn University, USA
Jing Bing Zhang, SIMTech, SG
Juan Pimentel, Kettering University, USA
Juergen Becker, University of Karlsruhe, DE
Karel Jezernik, Uni. Maribor, SL
Laurence T. Yang, St. Francis Xavier University, CA
Leopoldo Franquelo, Universidad de Sevilla, ES
Lionel Torres, LIRMM, FR
Marian Adamski, Univ. Zielona Gora, PL
Mo-Yuen Chow, North Carolina State University, USA
P. S. Thiagarajan, National Univ. of Singapore, SG
Paul Drews, APS-European Centre for Mechatronics, DE

Publicity Committee:
Christer Norstrom, Mälardalen University, SE
Chi-Sheng Shih, National Taiwan University, TW
José Carlos Metrôlho, I.P.Castelo Branco ,PT
Luis Almeida, Univ. Aveiro ,PT
Ricardo Machado, Univ. Minho, PT

SIES Series Steering Committee:
Luis Gomes, Univ. Nova Lisboa, PT (chair)
Eric Dekneuvel, I3S/UNSA , FR
James C. Hung, Univ. of Tennessee, USA
Richard Zurawski, ISA Group., USA

IES Information Technology Liaison
Antonio Luque Estepa, Universidad de Sevilla, ES

Publication Chair
Alberto Bosio, LIRMM, FR

Local Organizing Committee
Gilles Sassatelli, LIRMM, FR
Pascal Benoit, LIRMM, FR
Lionel Torres, LIRMM, FR
Nicolas Saint-Jean, LIRMM, FR
Olivier Brousse, LIRMM, FR
Michel Robert, LIRMM, FR
Alberto Bosio, LIRMM, FR

Technical Program Committee
Achim Rettberg, University of Paderborn, DE
Adam Pawlak, Silesian University of Technology, PL
Alfredo Rosado Muñoz, Universitat de València, ES
Angelo Perkusich, Federal University of Campina Grande, BR
Anshul Kumar, IIT New-Delhi, IN
António Ferrari, Universidade de Aveiro, PT
Arnaldo Oliveira, University of Aveiro, PT
Bartolomeo Montrucchio, Politecnico di Torino, IT
Berhnard Schätz, T.U. Munich, DE
Carlos Cardeira, Instituto Superior Técnico, PT
Carlos Eduardo Pereira, Univ. Fed. Rio Grande do Sul, BR
Cesar Ortega-Sanchez, Curtin University of Technology, AUS
Charles Andre, I3S/UNSA, FR
Chin-Long Wey, National Central University Taiwan, TW
Chi-Sheng Shih, National Taiwan University, TW
Christoph Grimm, TU Wien, AU
Christophe Bobda, University of Potsdam, DE
Dieter Zöbel, Univ. Koblenz-Landau, DE
Edgar Nett, University of Magdeburg, DE
Eduardo de la Torre, Universidad Politécnica de Madrid, ES
Elvinia Riccobene, University of Milan, IT
Enrico Vicario, University of Florence, IT
Fabrice Muller, I3S UNSA, FR
Falk Salewski, RWTH Aachen University, DE
Fernando Moraes, PUCRS, BR
Francoise Simonot-Lion, LORIA, FR
Gianluca Cena, IEIIT-CNR, IT
Horácio Neto, Instituto Superior Técnico, PT
Iain Bate, University of York, UK
Ian O'Connor, EC Lyon, FR
Ingo Sander, Royal Institute of Technology, SE
Jan Madsen, Technical University of Denmark, DK
Jari Nurmi, Tampere University of Technology, FI
Jeen G. Khor, Intel Malaysia Communications Design Center, MY
Jiman Hong, Kwangwoon University, KR
Joao Cardoso, Instituto Superior Técnico, PT
João Goes, Universidade Nova de Lisboa, PT
Joao Paulo Barros, I.P.Beja, PT
José Alberto Fonseca, University of Aveiro, PT
José Barata, Univ. Nova Lisboa, PT
José Lastra, Tampere University of Technology, FI
Juan-Jose Rodriguez-Andina, Univ. Vigo, ES
Kenneth Kent, University of New Brunswick, CA
Kim Sandström, Nokia Research, FI
Laurent George, ECE, FR
Liliana Cucu, Loria, FR
Lucia Lo Bello, University of Catania, IT
Luigi Carro, UFRGS, BR
Luis Bernardo, Universidade Nova de Lisboa, PT
Marco di Natale, santAnna school of advanced studies, IT
Marek Wegrzyn, Univ. Zielona Gora, PL
Marisol Garcia-Valls, University Carlos 3 of Madrid, ES
Martin Horauer, University of Applied Sciences Technikum Wien, AU
Michael Huebner, University of Karlsruhe, DE
P. S. Thiagarajan, National University of Singapore, SG
Patrick Schaumont, Virginia Tech, USA
Paulo E. Miyagi, University of Sao Paulo, BR
Paulo Maciel, Federal University of Pernambuco, BR
Paulo Pedreiras, University of Aveiro, PT
Peeter Ellervee, Tallinn University of Technology, ET
Peter Palensky, TU Wien, AU
Ricardo Jacobi, University of Brasilia, BR
Ricardo Machado, Universidade do Minho, PT
Sandeep Shukla, Virginia Tech, USA
Sébastien Faucou, Irccyn, FR
Sergio Yovine, IMAG, FR
Shashi Kumar, Jönköping University, SE
Sofiène Tahar, Concordia University, CA
Stefan M. Petters, NICTA, AUS
Tanguy Risset, INRIA / ENS Lyon, FR
Tei-Wei Kuo, National Taiwan University, TW
Thomas Nolte, MRTC Mälardalen, SE
Tiberiu Seceleanu, ABB Corporate Research, SE
Valery Sklyarov, Universidade de Aveiro, PT
Wolfgang A. Halang, FernUniversität Hagen, DE
Zdenek Hanzalek, Czech Technical University of Prague, CZ
Zili Shao, Hong Kong Polytechnic University, HK
------------------------------------------------------------------------